Understanding the Microlithography Adhesion for Various Substrate Materials

Discheminc09 Nov, 2021Business

Photoresist adhesion is one of the most important factors for successful HMDS fabrication. Different kinds of substrate material need more or less suitable photoresist chemistries. In lithography, photoresist is the photosensitive polymers that are selectively removed after being exposed to light. There are two basic categories of HMDS photoresist adhesion: Negative tone electron beam resist and Positive tone electron beam resist.