Hsq Hydrogen Silsesquioxane Resist

Discheminc26 Aug, 2021Other

Hsq hydrogen silsesquioxane resist is a kind of inorganic chemical compound used in photolithography and Electron-beam lithography. The thickness of the hsq hydrogen's coated resist plays a crucial function in the achievable resolution. Hsq hydrogen allows non-scale structures to be etched. To achieve cross-linking of the HSQ, it is exposed to e-beam or EUV radiation with wavelengths shorter than 157 nm. In this article, a detailed description of the Hsq hydrogen was done. Keep reading further to understand this process.